Stocks in play: HPQ Silicon Inc.
Updates shareholders on a recent patent filing related to its “Silicon-based anode material initiative.” HPQ filed a new provisional patent application in France related to a continuous Silicon Oxide (SiOx) manufacturing process based on a modified PUREVAPTM QRR design. As per French law, HPQ acquired all rights held by the inventors for C$90,000.00. The patent protects a unique QRR technology configuration that allows the production of SiOx on the same equipment. HPQ Silicon Inc. shares V.HPQ are trading down $0.01 at $0.24.
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